There are four key applications for SPhotonix fused quartz nanofabrication technology: DIC Prisms and Polarization Smoothers, S Waveplates and Test Targets.

In DIC prisms, the gradient birefringence pattern “inscribed” into fused quartz enables spatial separation of the orthogonally polarized components of the light beam. The further processing of these components makes it possible to visualize the objects, which are virtually invisible in conventional microscopy.

The Polarization Smoothers are needed for high-energy UV laser systems, in which smoothing of the intensity fluctuation across the high fluence light beam is of crucial importance. These fluctuations (speckles) appear due to interference of the scattered light waves. A Polarization Smoother makes orientation of electric field in different areas of the light beam cross section orthogonal. Since the orthogonal polarizations do not interfere with each other, the resulting speckle contrast in the beam transmitted through the polarization smoother will be suppressed. The SPhotonix technology enables inscription of the low loss birefringence pattern across the fused quartz plate of virtually any size thus offering the breakthrough in laser fusion.

Waveplates are essential for many optical and photonic devices (microscopes, lasers, imaging systems etc.). They are used to alter the polarization state of the incident light beam. With Sphotonix ultrafast laser writing technology we can fabricate waveplates in fused silica with a wide range of retardance levels while keeping the optical losses below 10%.

SPhotonix test targets are reliable references for calibration and validation of birefringence effects in various optical systems, including polarized light microscopy, polarimetry, or stress analysis systems. We can provide samples with birefringence patterns with a resolution of 0.5 μm with a slow axis azimuth error of ±1°

There is a broad range of uses for our fused quartz optical devices:

• Microscope Integration: compatible with transmitted and reflected light DIC microscopy, suitable for quantitative orientation-independent DIC microscopy, designed for Olympus, Nikon, Zeiss and Leica systems, seamlessly integrated into existing setups, offering enhanced optical performance.

• Custom Optical Components: The flexibility of birefringence pattering enables the creation of various optical components such as beam splitters, retarders and geometric phase elements.

• Adaptability: Laser writing parameters can be adjusted to fabricate birefringementprisms and other optical components on demand  .

The key use for our technology as Polarization Beam Smoothers is for high power laser systems. We deliver beam smoothing for uniform energy deposition in UV laser systems including Laser Fusion Facilities. It enhances beam uniformity critical for symmetric compression of fusion targets in inertial confinement fusion (ICF) experiments at the 355 nm wavelength. It is also tailored for seamless integration into beamlines of high-energy laser systems. We can also customize designs to match the specific optical requirements:

1. High optical transmission - High transmittance (>98%) in UV wavelengths particularly at 355nm.

2. High damage threshold - Comparable to pristine silica glass capable of withstanding high-energy pulses in laser fusion environments.

3. Retardance control - Custom retardance values with high precision for specific beam shaping requirements.

4. Surface flatness - y λ/10 RMS at UV wavelengths for minimal wavefront distortion.

There are two key uses:

1. Lasers

2. Polarization microscopy

S-waveplates can be used in laser physics. In particular they can be used for

• rotation of the pump laser lights polarization to match the absorption polarization of the active laser crystal

• rotation of the lasers polarization for best coupling into a single mode PM fiber

• Altering the laser light’s polarization state for preparation to various optical and opto-electrical processes (frequency doubling, Pockels effect etc.)

For polarization microscopy the S-waveplates can be used to rotate the incoming light’s polarization to enhance the contrast and precision of the microscope's images.

It is compatible with transmitted and reflected light DIC microscopy, suitable for quantitative orientation-independent DIC microscopy, designed for Olympus, Nikon, Zeiss and Leica systems, seamlessly integrated into existing setups, offering enhanced optical performance.

The prisms are manufactured using ultrafast laser writing in silica glass, enabling precise birefringence patterning for high performance imaging. These prisms provide an innovative, cost-effective and compact alternative to conventional Wollaston and Nomarski prisms.

The Polarization Smoothers are needed for high-energy UV laser systems, in which smoothing of the intensity fluctuation across the high fluence light beam is of crucial importance. These fluctuations (speckles) appear due interference of the scattered light waves. A Polarization Smoother makes orientation of electric field in different areas of the light beam cross section orthogonal. Since the orthogonal polarizations do not interfere with each other, the resulting speckle contrast in the beam transmitted through the polarization smoother will be suppressed. The SPhotonix technology enables inscription of the low loss birefringence pattern across the fused quartz plate of virtually any size thus offering the breakthrough in the laser fusion technology.

With Sphotonix ultrafast laser writing technology we can fabricate waveplates in fused silica with a wide range of retardance levels while keeping the optical losses below 10%. Sphotonix offers λ/2, λ/4 and custom retardance waveplates for wavelengths ranging from 300 nm to 1500 nm.

Our test targets are reliable references for calibration and validation of birefringence effects in various optical systems, including polarized light microscopy, polarimetry, or stress analysis systems. We can provide samples with birefringence patterns with a resolution of 0.5 μm with a slow axis azimuth error of ±1°

1. Durability: High damage threshold ensures reliable performance under intense laser operations.

2. Cost effective: Advanced fabrication techniques provide a more economical alternative to conventional birefringent materials.

3. Precision: High accuracy in polarization beam smoothing for fusion energy research.

4. Customizability: Tailored designs for specific beam shaping and polarization control needs.

5. Compact Design: Flat optical elements reduce system size while maintaining high optical

1. Size - our laser written prisms are thinner than traditional Wollaston prisms, reducing overall system size

2. Flexibility - we are able to customer slow axis azimuth and retardance profile to meet your specific requirements

3. Performance - we deliver high transmittance (>99%) and negative form birefringence (-0.0035) comparable to quartz (+0.009).

4. Cost effectiveness - we have lower manufacturing costs due to the efficiency and precision of ultrafast laser writing

5. Compatibility - our prisms are a direct replacement for commercially available DIC prisms

1. Custom design: With SPhotonix technology 2D and 3D custom birefringent structures can be made in a fused silica glass.

2. Precision: We can provide birefringence patterns with a resolution of 0.5 μm with a slow axis azimuth error of ±1°

Durability is the major advantage of the SPhotonix optical devices and components, which are made from the fused quartz, the material of choice form the devices operating in a wide spectral range spanning from the infrared to ultraviolet radiation. Sphotonix technology relies on ultra precise nanofabrication using fused quartz.

The SPhotonix nanofabrication technology can be used by a wide range of professionals developing devices to control the infrared, visual and ultraviolet radiation across the optoelectronics sectors. Our patented technology is defined as being adaptive optics due to its broad use and application, using femtolasers.

The SPhotonix optical device fabrication technology relies on the inscription into a fused quartz  slab a birefringence pattern by irradiating it with high intensity femtosecond laser pulses, that is nanofabrication.

The time needed for production of a particular optical device depends on the number and lateral size of the birefringent layers that should be inscribed into the fused quartz slab.